Search research articles
Contact Us
Filters
Showing results (1-10 of 61) with videos related to
Page
of 7
Sort By:
Optics Express
|
October 13, 2022
Achieving high aspect ratio in plasmonic lithography for practical applications with sub-20 nm half pitch
Dandan Han, Yayi Wei
Applied Optics
|
April 3, 2024
Method for optical proximity correction based on a vector imaging model
Ruixuan Wu, Lisong Dong, Yayi Wei
Applied Optics
|
April 3, 2024
SCAPSM: attenuated phase-shift mask structure for EUV lithography
Chen Li, Lisong Dong, Yayi Wei
Optics Express
|
June 11, 2026
High-aspect-ratio plasmonic lithography via decaying feature amplification
Chuang Wu, Dandan Han, Yayi Wei
Nanoscale Advances
|
August 28, 2023
Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy
Dandan Han, Tianchun Ye, Yayi Wei
Applied Optics
|
March 10, 2021
Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithm
Rongbo Zhao, Lisong Dong, Rui Chen, et al.
Nanotechnology
|
April 15, 2025
Enhancing lithographic accuracy by mitigating overlay errors via mask-induced thermal and mechanical optimization
Dinghai Rui, Libin Zhang, Yayi Wei, et al.
Microsystems & Nanoengineering
|
April 3, 2023
Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation
Dandan Han, Sen Deng, Tianchun Ye, et al.
Nanoscale Advances
|
September 8, 2025
Method of high-order advanced lithography overlay correction to enhance the manufacturing performance of integrated circuits
Dinghai Rui, Libin Zhang, Yayi Wei, et al.
Optics Express
|
August 13, 2025
Fast simulation method of lithography latent image on non-planar wafer for large area mask
Yihan Zhao, Lisong Dong, Yayi Wei, et al.
Page
of 7
Search research articles
Search
Showing results (1-10 of 61) with videos related to
Sort By:
Page
of 7
Optics Express
|
October 13, 2022
Achieving high aspect ratio in plasmonic lithography for practical applications with sub-20 nm half pitch
Dandan Han, Yayi Wei
Applied Optics
|
April 3, 2024
Method for optical proximity correction based on a vector imaging model
Ruixuan Wu, Lisong Dong, Yayi Wei
Applied Optics
|
April 3, 2024
SCAPSM: attenuated phase-shift mask structure for EUV lithography
Chen Li, Lisong Dong, Yayi Wei
Optics Express
|
June 11, 2026
High-aspect-ratio plasmonic lithography via decaying feature amplification
Chuang Wu, Dandan Han, Yayi Wei
Nanoscale Advances
|
August 28, 2023
Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy
Dandan Han, Tianchun Ye, Yayi Wei
Applied Optics
|
March 10, 2021
Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithm
Rongbo Zhao, Lisong Dong, Rui Chen, et al.
Nanotechnology
|
April 15, 2025
Enhancing lithographic accuracy by mitigating overlay errors via mask-induced thermal and mechanical optimization
Dinghai Rui, Libin Zhang, Yayi Wei, et al.
Microsystems & Nanoengineering
|
April 3, 2023
Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation
Dandan Han, Sen Deng, Tianchun Ye, et al.
Nanoscale Advances
|
September 8, 2025
Method of high-order advanced lithography overlay correction to enhance the manufacturing performance of integrated circuits
Dinghai Rui, Libin Zhang, Yayi Wei, et al.
Optics Express
|
August 13, 2025
Fast simulation method of lithography latent image on non-planar wafer for large area mask
Yihan Zhao, Lisong Dong, Yayi Wei, et al.
Page
of 7