Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Filters

Yayi Wei

Showing results (11-20 of 61) with videos related to

Pageof 7
Sort By:
Optics Letters|July 1, 2024
Mask structure optimization for beyond EUV lithographyZiqi Li, Lisong Dong, Ma Xu, et al.
Optics Express|November 22, 2024
LIC-CGAN: fast lithography latent images calculation method for large-area masks using deep learningYihan Zhao, Lisong Dong, Ziqi Li, et al.
Applied Optics|October 19, 2023
Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5  nm technology nodeZhishu Chen, Lisong Dong, Huwen Ding, et al.
Nanoscale Advances|May 28, 2026
EPE contribution analysis method of multiple patterning lithography by Monte Carlo and Sobol sensitivity analysisFei Ai, Xiaojing Su, Yajuan Su, et al.
Applied Optics|February 23, 2023
Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithographyRongbo Zhao, Yayi Wei, Hong Xu, et al.
Applied Optics|October 18, 2022
Optical proximity correction by using unsupervised learning and the patch loss functionPengpeng Yuan, Peng Xu, Le Ma, et al.
Optics Express|June 29, 2023
Decomposition-learning-based thick-mask model for partially coherent lithography systemZiqi Li, Lisong Dong, Xu Ma, et al.
Optics Express|October 7, 2021
Compensation of EUV lithography mask blank defect based on an advanced genetic algorithmRuixuan Wu, Lisong Dong, Xu Ma, et al.
Applied Optics|December 1, 2023
Optical proximity correction by using unsupervised learning and the patch loss function: publisher's notePengpeng Yuan, Peng Xu, Le Ma, et al.
Optics Express|July 21, 2023
Influence of the vibration of extreme ultraviolet lithographic tool stages on imagingHao Shen, Libin Zhang, Yayi Wei, et al.
Pageof 7

Showing results (11-20 of 61) with videos related to

Sort By:
Pageof 7
Optics Letters|July 1, 2024
Mask structure optimization for beyond EUV lithographyZiqi Li, Lisong Dong, Ma Xu, et al.
Optics Express|November 22, 2024
LIC-CGAN: fast lithography latent images calculation method for large-area masks using deep learningYihan Zhao, Lisong Dong, Ziqi Li, et al.
Applied Optics|October 19, 2023
Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5  nm technology nodeZhishu Chen, Lisong Dong, Huwen Ding, et al.
Nanoscale Advances|May 28, 2026
EPE contribution analysis method of multiple patterning lithography by Monte Carlo and Sobol sensitivity analysisFei Ai, Xiaojing Su, Yajuan Su, et al.
Applied Optics|February 23, 2023
Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithographyRongbo Zhao, Yayi Wei, Hong Xu, et al.
Applied Optics|October 18, 2022
Optical proximity correction by using unsupervised learning and the patch loss functionPengpeng Yuan, Peng Xu, Le Ma, et al.
Optics Express|June 29, 2023
Decomposition-learning-based thick-mask model for partially coherent lithography systemZiqi Li, Lisong Dong, Xu Ma, et al.
Optics Express|October 7, 2021
Compensation of EUV lithography mask blank defect based on an advanced genetic algorithmRuixuan Wu, Lisong Dong, Xu Ma, et al.
Applied Optics|December 1, 2023
Optical proximity correction by using unsupervised learning and the patch loss function: publisher's notePengpeng Yuan, Peng Xu, Le Ma, et al.
Optics Express|July 21, 2023
Influence of the vibration of extreme ultraviolet lithographic tool stages on imagingHao Shen, Libin Zhang, Yayi Wei, et al.
Pageof 7