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Yayi Wei

Showing results (31-40 of 61) with videos related to

Pageof 7
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Nanoscale|February 8, 2024
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterningRongbo Zhao, Xiaolin Wang, Hong Xu, et al.
ACS Applied Materials & Interfaces|April 16, 2024
Machine Learning Applied to Electron Beam Lithography to Accelerate Process Optimization of a Contact Hole LayerRongbo Zhao, Xiaolin Wang, Yayi Wei, et al.
Optics Express|October 12, 2022
High-precision lithography thick-mask model based on a decomposition machine learning methodZiqi Li, Lisong Dong, Xuyu Jing, et al.
Optics Express|April 27, 2022
Fast aerial image model for EUV lithography using the adjoint fully convolutional networkJiaxin Lin, Lisong Dong, Taian Fan, et al.
Applied Optics|November 22, 2018
Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodesJianfang He, Lisong Dong, Lijun Zhao, et al.
Optics Express|March 5, 2024
Dynamic budget analysis of multiple parameters in a lithography system based on the superposition of light intensity fluctuationsJiashuo Wang, Xiaojing Su, Lisong Dong, et al.
Optics Express|September 13, 2019
Learning-based compressive sensing method for EUV lithographic source optimizationJiaxin Lin, Lisong Dong, Taian Fan, et al.
Optics Letters|September 29, 2017
Mitigating the influence of wafer topography on the implantation process in optical lithographyLisong Dong, Wenhui Chen, Taian Fan, et al.
Nanoscale Research Letters|November 17, 2016
A Novel Nanofabrication Technique of Silicon-Based NanostructuresLingkuan Meng, Xiaobin He, Jianfeng Gao, et al.
Nanoscale Research Letters|August 27, 2015
CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single MaskLingkuan Meng, Jianfeng Gao, Xiaobin He, et al.
Pageof 7

Showing results (31-40 of 61) with videos related to

Sort By:
Pageof 7
Nanoscale|February 8, 2024
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterningRongbo Zhao, Xiaolin Wang, Hong Xu, et al.
ACS Applied Materials & Interfaces|April 16, 2024
Machine Learning Applied to Electron Beam Lithography to Accelerate Process Optimization of a Contact Hole LayerRongbo Zhao, Xiaolin Wang, Yayi Wei, et al.
Optics Express|October 12, 2022
High-precision lithography thick-mask model based on a decomposition machine learning methodZiqi Li, Lisong Dong, Xuyu Jing, et al.
Optics Express|April 27, 2022
Fast aerial image model for EUV lithography using the adjoint fully convolutional networkJiaxin Lin, Lisong Dong, Taian Fan, et al.
Applied Optics|November 22, 2018
Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodesJianfang He, Lisong Dong, Lijun Zhao, et al.
Optics Express|March 5, 2024
Dynamic budget analysis of multiple parameters in a lithography system based on the superposition of light intensity fluctuationsJiashuo Wang, Xiaojing Su, Lisong Dong, et al.
Optics Express|September 13, 2019
Learning-based compressive sensing method for EUV lithographic source optimizationJiaxin Lin, Lisong Dong, Taian Fan, et al.
Optics Letters|September 29, 2017
Mitigating the influence of wafer topography on the implantation process in optical lithographyLisong Dong, Wenhui Chen, Taian Fan, et al.
Nanoscale Research Letters|November 17, 2016
A Novel Nanofabrication Technique of Silicon-Based NanostructuresLingkuan Meng, Xiaobin He, Jianfeng Gao, et al.
Nanoscale Research Letters|August 27, 2015
CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single MaskLingkuan Meng, Jianfeng Gao, Xiaobin He, et al.
Pageof 7