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Advanced Materials (Deerfield Beach, Fla.)|June 6, 2019
Modeling of Negative Capacitance in Ferroelectric Thin FilmsHyeon Woo Park, Jangho Roh, Yong Bin Lee, et al.Journal of the Korean Association of Oral and Maxillofacial Surgeons|March 6, 2015
Low-grade osteosarcoma arising from cemento-ossifying fibroma: a case reportYong Bin Lee, Nam-Kyoo Kim, Jae-Young Kim, et al.Plos One|May 17, 2019
Accuracy of modified CAD/CAM generated wafer for orthognathic surgeryJin Hoo Park, Yong-Bin Lee, Sang Yoon Kim, et al.Nanoscale|October 4, 2023
Impact of operation voltage and NH<sub>3</sub> annealing on the fatigue characteristics of ferroelectric AlScN thin films grown by sputteringKyung Do Kim, Yong Bin Lee, Suk Hyun Lee, et al.Nanoscale|January 21, 2021
Polarizing and depolarizing charge injection through a thin dielectric layer in a ferroelectric-dielectric bilayerHyeon Woo Park, Seung Dam Hyun, In Soo Lee, et al.Nanotechnology|June 1, 2017
Preparation and characterization of ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> thin films grown by reactive sputteringYoung Hwan Lee, Han Joon Kim, Taehwan Moon, et al.Nano Letters|November 8, 2017
Voltage Drop in a Ferroelectric Single Layer Capacitor by Retarded Domain NucleationYu Jin Kim, Hyeon Woo Park, Seung Dam Hyun, et al.Nanoscale Research Letters|April 9, 2020
A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) PrecursorsBaek Su Kim, Seung Dam Hyun, Taehwan Moon, et al.ACS Applied Materials & Interfaces|September 25, 2018
Dispersion in Ferroelectric Switching Performance of Polycrystalline Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin FilmsSeung Dam Hyun, Hyeon Woo Park, Yu Jin Kim, et al.Pageof 1