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Ultramicroscopy|May 4, 2001
Imaging conditions for reliable measurement of displacement and strain in high-resolution electron microscopyM J Hÿtch, T PlamannUltramicroscopy|September 8, 2001
Glassy cholesteric structure: thickness variation induced by electron radiation in transmission electron microscopy investigated by atomic force microscopyA Boudet, M Mitov, C Bourgerette, et al.Ultramicroscopy|September 8, 2001
Optimization of digital filters for the detection of trace elements in EELS. III--Gaussian, homomorphic and adaptive filtersJ Michel, N BonnetUltramicroscopy|September 8, 2001
Validity of the dipole-selection rule for the Al-L2,3 edge of alpha-Al2O3 under channeling conditionsS Nufer, T Gemming, S Köstlmeier, et al.Ultramicroscopy|October 17, 2002
Convergent beam electron diffraction extinction distance measurements for quantitative analysis of si(1-x),Ge(x)D Delille, R Pantel, G Vincent, et al.Ultramicroscopy|October 17, 2002
Background subtraction for low-loss transmission electron energy-loss spectroscopyB W Reed, M SarikayaUltramicroscopy|November 26, 1999
An approach to an objective background subtraction for elemental mapping with core-edges down to 50 eV: description, evaluation and applicationA Haking, H Troester, K Richter, et al.Ultramicroscopy|May 11, 2000
The orientation-dependent simulation of ELNESHebert-Souche, Louf, Blaha, et al.Ultramicroscopy|May 11, 2000
Charging phenomena in PEEM imaging and spectroscopyB Gilbert, R Andres, P Perfetti, et al.Ultramicroscopy|August 17, 2000
Modulation imaging in reflection-mode near-field scanning optical microscopyKerimo, Buchler, SmyrlPageof 458