Shih-Nan Hsiao
5PUBLICATIONS
1CO-AUTHORS
Get your video featured.
Publish with JoVEGet your video featured.
Publish with JoVE
Publications (5)
Sort by Publication Date:
|Nov 22, 2025
Cryogenic-Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra-High Selectivity of Atomic Layer Etching Between SiO2 and SiN.Shih-Nan Hsiao, Makoto Sekine, Ryutaro Suda
|Oct 08, 2025
Halogen-Free Anisotropic Atomic-Layer Etching of HfO2 at Room Temperature.Shih-Nan Hsiao, Pak-Man Yiu, Li-Chun Chang
|Sep 22, 2024
Nonhalogen Dry Etching of Metal Carbide TiAlC by Low-Pressure N2/H2 Plasma at Room Temperature.Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao
|Jun 02, 2024
Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO2 by Cryogenic-Assisted Surface Reactions.Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun
|Jul 13, 2023
In Situ Monitoring of Etching Characteristic and Surface Reactions in Atomic Layer Etching of SiN Using Cyclic CF4/H2 and H2 Plasmas.Shih-Nan Hsiao, Makoto Sekine, Masaru Hori
Pageof 1
