Haneul Lee

1PUBLICATIONS
2CO-AUTHORS
Software quality, processes and metrics
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Publications (1)

|Jul 02, 2021
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma.

Ji-Won Kwon, Sangwon Ryu, Jihoon Park

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Frequent Collaborators

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Ji-Won Kwon

1 joint publications

Sangwon Ryu