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Sangwon Ryu

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Software quality, processes and metrics

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Publications (1)

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|Jul 02, 2021

Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF<sub>6</sub>/O<sub>2</sub>/Ar Capacitively Coupled Plasma.

Ji-Won Kwon, Sangwon Ryu, Jihoon Park

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Haneul Lee

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Ji-Won Kwon

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Haneul Lee

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