Yuichi Oshima
4PUBLICATIONS
3CO-AUTHORS
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Publications (4)
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|Dec 03, 2025
Rapid homoepitaxial growth of (011) β-Ga<sub>2</sub>O<sub>3</sub> by HCl-based halide vapor phase epitaxy.Yuichi Oshima, Takayoshi Oshima
|Sep 08, 2025
HCl-gas etching behavior of (001) β-Ga<sub>2</sub>O<sub>3</sub> under oxygen supply.Yuichi Oshima, Takayoshi Oshima
|Apr 24, 2025
Epitaxial lateral overgrowth of <i>m</i>-plane α-Ga<sub>2</sub>O<sub>3</sub> by halide vapor phase epitaxy.Yuichi Oshima, Takashi Shinohe
|Jul 31, 2024
Plasma-free anisotropic selective-area etching of β-Ga<sub>2</sub>O<sub>3</sub> using forming gas under atmospheric pressure.Takayoshi Oshima, Rie Togashi, Yuichi Oshima
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