Wei Hang
7PUBLICATIONS
5CO-AUTHORS
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Publications (7)
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|May 25, 2024
Research on the Influence of the Material Removal Profile of a Spherical Polishing Tool on the Mid-Spatial Frequency Errors of Optical Surfaces.Zhaohao He, Kuo Hai, Kailong Li
|Mar 29, 2023
Research on Chemical Mechanical Polishing Technology for Zirconium-Based Amorphous Alloys.Wei Hang, Chao Song, Ziliang Yin
|Jan 21, 2023
CMP Pad Conditioning Using the High-Pressure Micro-Jet Method.Xin Li, Yinggang Wang, Hongyu Chen
|May 28, 2022
Effects of pH Values and H2O2 Concentrations on the Chemical Enhanced Shear Dilatancy Polishing of Tungsten.Liang Xu, Lin Wang, Hongyu Chen
|Aug 13, 2020
The Mechanism of Layer Stacked Clamping (LSC) for Polishing Ultra-Thin Sapphire Wafer.Zhixiang Chen, Linlin Cao, Julong Yuan
|Dec 19, 2019
On the Room-Temperature Creep Behavior and Its Correlation with Length Scale of a LiTaO3 Single Crystal by Spherical Nanoindentation.Wei Hang, Xianwei Huang, Min Liu
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