Alfredo Mameli

7PUBLICATIONS
10CO-AUTHORS
Elemental semiconductorsCompound semiconductorsSensor technology (incl. chemical aspects)Catalysis and mechanisms of reactionsAtmospheric aerosols
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Journal

Publications (7)

|Mar 05, 2024
Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO<sub>2</sub> and TiON on SiN vs SiO<sub>2</sub>.

Alfredo Mameli, Kanda Tapily, Jie Shen

|Jul 18, 2023
Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry Considerations.

Alfredo Mameli, Andrew V Teplyakov

|Apr 12, 2023
High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO<sub>2</sub> with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity.

Bora Karasulu, Fred Roozeboom, Alfredo Mameli

|Mar 25, 2022
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors.

Marc J M Merkx, Athanasios Angelidis, Alfredo Mameli

|Nov 26, 2021
Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO<sub>2</sub> Studied by Gas-Phase Infrared and Optical Emission Spectroscopy.

M A Mione, V Vandalon, A Mameli

|Oct 05, 2018
Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O<sub>2</sub> Plasma.

A Mameli, M A Verheijen, A J M Mackus

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Frequent Collaborators

4 joint publications

Wilhelmus M M Kessels

3 joint publications

Adriaan J M Mackus

2 joint publications

Bora Karasulu

1 joint publications

M A Mione