Stacey F Bent
39PUBLICATIONS
106CO-AUTHORS

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Publications (39)
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|Dec 15, 2025
Anhydrous Atomic Layer Deposition of HfO<sub>2</sub>: Mechanistic Analysis of the Tetrakis(dimethylamido)hafnium (TDMAH)-O<sub>2</sub> Process.Miso Kim, Seunggi Seo, Woong Pyo Jeon
|Oct 22, 2025
Cryogenic X-ray photoelectron spectroscopy for battery interfaces.Sanzeeda Baig Shuchi, Giulio D'Acunto, Philaphon Sayavong
|Sep 26, 2025
Effect of Networking Density on the Patterning Performance of Molecular Layer Deposited Alucone Electron Beam/EUV Resists.Long Viet Than, Giulio D'Acunto, Maggy Harake
|Sep 08, 2025
Precursor Engineering of Atomic Layer Deposition for Top-Gate Insulators on Monolayer MoS<sub>2</sub> Transistors.Alexander B Shearer, Jung-Soo Ko, Anh Tuan Hoang
|Aug 20, 2025
Role of Precursor Miscibility in Area-Selective Atomic Layer Deposition.Alexander Shearer, Yukio Cho, Andreas Werbrouck
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Frequent Collaborators
9 joint publications
Yi Cui
6 joint publications
Tzu-Ling Liu
5 joint publications
Li Zeng
4 joint publications
Bonggeun Shong
4 joint publications
Il-Kwon Oh
4 joint publications
Giulio D'Acunto
4 joint publications
David T Boyle
4 joint publications
Sang Cheol Kim
4 joint publications
Solomon T Oyakhire
3 joint publications
Arun S Asundi