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Xudong Guo

5PUBLICATIONS
7CO-AUTHORS
Polymers and plasticsReaction engineering (excl. nuclear reactions)GlassCompound semiconductorsOptical properties of materials
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Journal

Publications (5)

Sort by Publication Date:
|Sep 16, 2024
Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography.

Xue Cong, Siliang Zhang, Jiaxing Gao

|Aug 07, 2023
Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography.

Siliang Zhang, Long Chen, Jiaxing Gao

|Apr 10, 2023
A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography.

Yake Wang, Jundi Yuan, Jinping Chen

|Dec 29, 2022
Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm Nanolithography.

Zhihao Wang, Jinping Chen, Tianjun Yu

|Aug 29, 2022
Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography.

Yake Wang, Jinping Chen, Yi Zeng

Pageof 1

Frequent Collaborators

5 joint publications

Jinping Chen

5 joint publications

Shuangqing Wang

5 joint publications

Guoqiang Yang

5 joint publications

Yi Li

3 joint publications

Yi Zeng

3 joint publications

Tianjun Yu

2 joint publications

Rui Hu

Frequent Collaborators

5 joint publications

Jinping Chen

5 joint publications

Shuangqing Wang

5 joint publications

Guoqiang Yang

5 joint publications

Yi Li

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