Shuangqing Wang
10PUBLICATIONS
9CO-AUTHORS
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Publications (10)
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|Sep 16, 2024
Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography.Xue Cong, Siliang Zhang, Jiaxing Gao
|Apr 09, 2024
A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography.Xuewen Cui, Siliang Zhang, Xue Cong
|Feb 12, 2024
A chalcone-based ESIPT and AIE fluorophore for β-gal imaging in living cells.Yiran Hu, Haiyan Luo, Luyao Zhao
|Aug 07, 2023
Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography.Siliang Zhang, Long Chen, Jiaxing Gao
|Apr 10, 2023
A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography.Yake Wang, Jundi Yuan, Jinping Chen
|Dec 29, 2022
Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm Nanolithography.Zhihao Wang, Jinping Chen, Tianjun Yu
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