Ali Mohamed Ali
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CO-AUTHORS
Nanofabrication, growth and self assembly
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Publications
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ACS applied electronic materials
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May 18, 2026
Atomic Layer Etching of Nickel Using N2/H2 Plasma Exposure and Hexafluoroacetylacetone.
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Guillaume Krieger
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Harm C M Knoops
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joint publications
Wilhelmus M M Kessels
Frequent Collaborators
1
joint publications
Guillaume Krieger
1
joint publications
Harm C M Knoops
1
joint publications
Wilhelmus M M Kessels
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