Harm C M Knoops

6PUBLICATIONS
12CO-AUTHORS
Nanofabrication, growth and self assemblyChemical and thermal processes in energy and combustionMolecular and organic electronicsTransition metal chemistryAtmospheric aerosols
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Publications (6)

|May 18, 2026
Atomic Layer Etching of Nickel Using N2/H2 Plasma Exposure and Hexafluoroacetylacetone.

|Nov 25, 2024
Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma.

Nicholas J Chittock, Joost F W Maas, Ilker Tezsevin

|Dec 30, 2022
Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices.

Sven H Gerritsen, Nicholas J Chittock, Vincent Vandalon

|Jul 19, 2021
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2.

Karsten Arts, Harvey Thepass, Marcel A Verheijen

|Jun 04, 2021
Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2.

Karsten Arts, Sanne Deijkers, Riikka L Puurunen

|Jan 07, 2017
Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies.

Tahsin Faraz, Maarten van Drunen, Harm C M Knoops

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Frequent Collaborators

5 joint publications

Wilhelmus M M Kessels

2 joint publications

Karsten Arts

2 joint publications

Riikka L Puurunen

2 joint publications

Adriaan J M Mackus