Nicholas J Chittock

1PUBLICATIONS
6CO-AUTHORS
Chemical and thermal processes in energy and combustion
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Publications (1)

|Nov 25, 2024
Investigation of the atomic layer etching mechanism for Al<sub>2</sub>O<sub>3</sub> using hexafluoroacetylacetone and H<sub>2</sub> plasma.

Nicholas J Chittock, Joost F W Maas, Ilker Tezsevin

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Frequent Collaborators

1 joint publications

Joost F W Maas

1 joint publications

Ilker Tezsevin

1 joint publications

Marc J M Merkx

1 joint publications

Harm C M Knoops