Riikka L Puurunen
8PUBLICATIONS
13CO-AUTHORS
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Publications (8)
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|Jan 19, 2026
Atomic Layer Deposition on Particulate Materials from 1988 through 2023: A Quantitative Review of Technologies, Materials, and Applications.Peter M Piechulla, Mingliang Chen, Aristeidis Goulas
|Nov 07, 2024
Simulated conformality of atomic layer deposition in lateral channels: the impact of the Knudsen number on the saturation profile characteristics.Christine Gonsalves, Jorge A Velasco, Jihong Yim
|Feb 16, 2024
An atomic layer deposition diffusion-reaction model for porous media with different particle geometries.Niko Heikkinen, Juha Lehtonen, Riikka L Puurunen
|Aug 18, 2023
Simulation of conformality of ALD growth inside lateral channels: comparison between a diffusion-reaction model and a ballistic transport-reaction model.Jänis Järvilehto, Jorge A Velasco, Jihong Yim
|Mar 30, 2022
Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile.Jihong Yim, Emma Verkama, Jorge A Velasco
|Jul 19, 2021
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2.Karsten Arts, Harvey Thepass, Marcel A Verheijen
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Frequent Collaborators
3 joint publications
Karsten Arts
3 joint publications
Jihong Yim
3 joint publications
Jorge A Velasco
2 joint publications
Wilhelmus M M Kessels
2 joint publications
Harm C M Knoops
2 joint publications
Christine Gonsalves
1 joint publications
Clemens Mart
1 joint publications
Emma Verkama
1 joint publications
Jänis Järvilehto
1 joint publications
Niko Heikkinen
