Niklas Huster
4PUBLICATIONS
6CO-AUTHORS
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Publications (4)
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|Jan 28, 2026
Ruthenium(II) carbonyl amidates - a new class of precursors for atomic layer deposition.Jorit Obenlüneschloß, Cara-Lena Nies, Michael Gock
|Apr 15, 2024
Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition.Niklas Huster, Rita Mullins, Michael Nolan
|Sep 16, 2022
SnO deposition via water based ALD employing tin(II) formamidinate: precursor characterization and process development.Niklas Huster, Ramin Ghiyasi, David Zanders
|Jun 13, 2020
Additive-free spin coating of tin oxide thin films: synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes.Niklas Huster, David Zanders, Sarah Karle
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![The Synthesis of [Sn<sub>10</sub>(Si(SiMe<sub>3</sub>)<sub>3</sub>)<sub>4</sub>]<sup>2</sup><sup>-</sup> Using a Metastable Sn(I) Halide Solution Synthesized via a Co-condensation Technique](/_next/image?url=https%3A%2F%2Fcloudfront.jove.com%2FCDNSource%2Fteasers%2F54498.jpg&w=3840&q=75)