Michal Nolan

49PUBLICATIONS
88CO-AUTHORS
Elemental semiconductorsCompound semiconductorsMetal organic frameworksPhysical properties of materialsNanofabrication, growth and self assembly
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Publications (49)

|Jun 09, 2026
Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films.

|Feb 19, 2026
A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films.

Florian Preischel, Karl Rönnby, Martin Wilken

|Jan 28, 2026
Ruthenium(II) carbonyl amidates - a new class of precursors for atomic layer deposition.

Jorit Obenlüneschloß, Cara-Lena Nies, Michael Gock

|Dec 30, 2025
Control of Growth Morphology of Deposited fcc Metals through Tuning Substrate-Metal Interactions.

Samuel Aldana, Michael Nolan

|Dec 19, 2025
A first-principles study of the reactivity and layer-dependent properties of phosphorene.

Saba Abdul Shakoor, Michael Nolan

|Dec 19, 2025
VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties.

Jean-Pierre Glauber, Julian Lorenz, Ji Liu

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Frequent Collaborators

12 joint publications

Anjana Devi

10 joint publications

Arbresha Muriqi

7 joint publications

Ji Liu

6 joint publications

Karl Rönnby