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Detlef Rogalla

13PUBLICATIONS

42CO-AUTHORS

Compound semiconductorsNanofabrication, growth and self assemblyElemental semiconductorsReaction engineering (excl. nuclear reactions)Nanomaterials

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Publications (13)

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|Feb 19, 2026

A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films.

Florian Preischel, Karl Rönnby, Martin Wilken

|Dec 19, 2025

VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties.

Jean-Pierre Glauber, Julian Lorenz, Ji Liu

|Sep 05, 2025

Rare Mononuclear Lithium-Carbene Complex for Atomic Layer Deposition of Lithium Containing Thin Films.

Jorit Obenlüneschloß, Nils Boysen, Karl Rönnby

|Jul 22, 2024

A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction.

Jean-Pierre Glauber, Julian Lorenz, Ji Liu

|Nov 10, 2022

CVD Grown Tungsten Oxide for Low Temperature Hydrogen Sensing: Tuning Surface Characteristics via Materials Processing for Sensing Applications.

Martin Wilken, Engin Ciftyürek, Stefan Cwik

|May 11, 2022

Water assisted atomic layer deposition of yttrium oxide using tris(<i>N</i>,<i>N</i>'-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties.

Lukas Mai, Nils Boysen, Ersoy Subaşı

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Frequent Collaborators

13 joint publications

Anjana Devi

7 joint publications

Nils Boysen

5 joint publications

Michael Nolan

4 joint publications

Claudia Bock

3 joint publications

Jean-Pierre Glauber

3 joint publications

Lukas Mai

3 joint publications

Engin Ciftyurek

3 joint publications

Klaus Schierbaum

3 joint publications

David Zanders

2 joint publications

Martin Wilken

Frequent Collaborators

13 joint publications

Anjana Devi

7 joint publications

Nils Boysen

5 joint publications

Michael Nolan

4 joint publications

Claudia Bock

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