Detlef Rogalla

14PUBLICATIONS
49CO-AUTHORS
Transition metal chemistryCompound semiconductorsNanofabrication, growth and self assemblyElemental semiconductorsReaction engineering (excl. nuclear reactions)
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Publications (14)

|Jul 26, 2026
Phase Engineering of Plasma-Enhanced Atomic Layer Deposited Molybdenum Disulfide Using High Accuracy Direct Writing With Focused Li+ and Ga+ Ion Beams and Ultrashort Pulse Laser.

|Feb 19, 2026
A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films.

Florian Preischel, Karl Rönnby, Martin Wilken

|Dec 19, 2025
VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties.

Jean-Pierre Glauber, Julian Lorenz, Ji Liu

|Sep 05, 2025
Rare Mononuclear Lithium-Carbene Complex for Atomic Layer Deposition of Lithium Containing Thin Films.

Jorit Obenlüneschloß, Nils Boysen, Karl Rönnby

|Jul 22, 2024
A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction.

Jean-Pierre Glauber, Julian Lorenz, Ji Liu

|Nov 10, 2022
CVD Grown Tungsten Oxide for Low Temperature Hydrogen Sensing: Tuning Surface Characteristics via Materials Processing for Sensing Applications.

Martin Wilken, Engin Ciftyürek, Stefan Cwik

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Frequent Collaborators

13 joint publications

Anjana Devi

7 joint publications

Nils Boysen

5 joint publications

Michael Nolan

5 joint publications

Claudia Bock