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Niklas Huster

4PUBLICATIONS
6CO-AUTHORS
Metal organic frameworksElemental semiconductorsOrganic semiconductors
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Publications (4)

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|Jan 28, 2026
Ruthenium(II) carbonyl amidates - a new class of precursors for atomic layer deposition.

Jorit Obenlüneschloß, Cara-Lena Nies, Michael Gock

|Apr 15, 2024
Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition.

Niklas Huster, Rita Mullins, Michael Nolan

|Sep 16, 2022
SnO deposition <i>via</i> water based ALD employing tin(II) formamidinate: precursor characterization and process development.

Niklas Huster, Ramin Ghiyasi, David Zanders

|Jun 13, 2020
Additive-free spin coating of tin oxide thin films: synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes.

Niklas Huster, David Zanders, Sarah Karle

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Frequent Collaborators

4 joint publications

Anjana Devi

2 joint publications

Michael Nolan

2 joint publications

David Zanders

1 joint publications

Jorit Obenlüneschloß

1 joint publications

Cara-Lena Nies

1 joint publications

Maarit Karppinen

Frequent Collaborators

4 joint publications

Anjana Devi

2 joint publications

Michael Nolan

2 joint publications

David Zanders

1 joint publications

Jorit Obenlüneschloß

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