Thomas David
4PUBLICATIONS
11CO-AUTHORS
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Publications (4)
Sort by Publication Date:
|Dec 28, 2020
New Strategies for Engineering Tensile Strained Si Layers for Novel n-Type MOSFET.Thomas David, Isabelle Berbezier, Jean-Noël Aqua
|Feb 15, 2018
New strategies for producing defect free SiGe strained nanolayers.Thomas David, Jean-Noël Aqua, Kailang Liu
|Jan 04, 2018
Complex dewetting scenarios of ultrathin silicon films for large-scale nanoarchitectures.Meher Naffouti, Rainer Backofen, Marco Salvalaglio
|Nov 09, 2017
Tailoring Strain and Morphology of Core-Shell SiGe Nanowires by Low-Temperature Ge Condensation.Thomas David, Kailang Liu, Antoine Ronda
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Frequent Collaborators
2 joint publications
Luc Favre
1 joint publications
Pascal Gentile
1 joint publications
Michele Amato
1 joint publications
Meher Naffouti
1 joint publications
Rainer Backofen
1 joint publications
Marco Salvalaglio
1 joint publications
Ibtissem Fraj
1 joint publications
David Grosso
1 joint publications
Monica Bollani
1 joint publications
Isabelle Berbezier
