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Thomas David

4PUBLICATIONS

11CO-AUTHORS

Elemental semiconductorsCompound semiconductorsStructure and dynamics of materials

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Publications (4)

Sort by Publication Date:

|Dec 28, 2020

New Strategies for Engineering Tensile Strained Si Layers for Novel n-Type MOSFET.

Thomas David, Isabelle Berbezier, Jean-Noël Aqua

|Feb 15, 2018

New strategies for producing defect free SiGe strained nanolayers.

Thomas David, Jean-Noël Aqua, Kailang Liu

|Jan 04, 2018

Complex dewetting scenarios of ultrathin silicon films for large-scale nanoarchitectures.

Meher Naffouti, Rainer Backofen, Marco Salvalaglio

|Nov 09, 2017

Tailoring Strain and Morphology of Core-Shell SiGe Nanowires by Low-Temperature Ge Condensation.

Thomas David, Kailang Liu, Antoine Ronda

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Frequent Collaborators

2 joint publications

Luc Favre

1 joint publications

Pascal Gentile

1 joint publications

Michele Amato

1 joint publications

Meher Naffouti

1 joint publications

Rainer Backofen

1 joint publications

Marco Salvalaglio

1 joint publications

Ibtissem Fraj

1 joint publications

David Grosso

1 joint publications

Monica Bollani

1 joint publications

Isabelle Berbezier

Frequent Collaborators

2 joint publications

Luc Favre

1 joint publications

Pascal Gentile

1 joint publications

Michele Amato

1 joint publications

Meher Naffouti

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