Changbun Yoon
9PUBLICATIONS
2CO-AUTHORS

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Publications (9)
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|Jun 11, 2025
Deposition of HfO2 by Remote Plasma ALD for High-Aspect-Ratio Trench Capacitors in DRAM.Jiwon Kim, Inkook Hwang, Byungwook Kim
|Mar 13, 2025
Memory Devices with HfO2 Charge-Trapping and TiO2 Channel Layers: Fabrication via Remote and Direct Plasma Atomic Layer Deposition and Comparative Performance Evaluation.Inkook Hwang, Jiwon Kim, Joungho Lee
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