Hyochang Lee

6PUBLICATIONS
17CO-AUTHORS
Circuits and systemsElectrical energy generation (incl. renewables, excl. photovoltaics)Powder and particle technologyCatalysis and mechanisms of reactionsCompound semiconductors
Featured researcher

Get your video featured.

JoVEPublish with JoVE
Journal

Publications (6)

|Apr 01, 2026
Cryogenic etching device based on the conductive cooling method using liquid nitrogen bath.

Kil-Byoung Chai, Eun-Beom Choi, Hyo-Chang Lee

|Feb 11, 2026
Plasma Knowledge-Based Polymorphic Engineering for Two-Dimensional Semiconductor Contacts.

Ji Won Heo, Gwang-Seok Chae, Gyeong Deok Seo

|Sep 18, 2023
Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching.

Hee-Jung Yeom, Min Young Yoon, Daehan Choi

|Nov 11, 2022
Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe.

Youngseok Lee, Heejung Yeom, Daehan Choi

|Sep 13, 2022
Correlation with the Microstructure and Synergistic Physiochemical Etching Resistance of Nanocomposites under Fluorine-Containing Plasma Conditions.

Ho Jin Ma, Seongwan Hong, Hyeon-Myeong Oh

|Jun 09, 2021
Crystalline silicon nanoparticle formation by tailored plasma irradiation: self-structurization, nucleation and growth acceleration, and size control.

Daehan Choi, Jung Hyung Kim, Deuk Chul Kwon

Pageof 1

Frequent Collaborators

1 joint publications

Ho Jin Ma

1 joint publications

Seongwan Hong

1 joint publications

Hyeon-Myeong Oh

1 joint publications

Kundan Kumar