Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Kosuke Takenaka

1PUBLICATIONS
0CO-AUTHORS
Photovoltaic power systems
Featured researcher

Get your video featured.

JoVEPublish with JoVE
Featured researcher

Get your video featured.

JoVEPublish with JoVE
Journal

Publications (1)

Sort by Publication Date:
|Sep 07, 2018
Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films.

Kosuke Takenaka, Yuichi Setsuhara, Jeon Geon Han

Pageof 1

Frequent Collaborators

Frequent Collaborators

Top Related Videos

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
08:23

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Published on : Sep 28, 2019

7.9K
See more related videos

Top Related Videos

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
08:23

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Published on : Sep 28, 2019

7.9K
See more related videos