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Ingeniería de deformación elástica para disipación mecánica ultrabaja
A H Ghadimi1, S A Fedorov1, N J Engelsen1
1Institute of Physics, École Polytechnique Fédérale de Lausanne, 1015 Lausanne, Switzerland.
Science (New York, N.Y.)
|April 14, 2018
Resumen
Los ingenieros lograron una disipación mecánica ultra baja en dispositivos a nanoescala al combinar la tensión a nanoescala con la ingeniería fonónica de sujeción suave. Este avance permite sistemas nanomecánicos altamente coherentes con factores de calidad récord.
Área de la Ciencia:
- Ciencias de los materiales
- Nanotecnología
- Ingeniería mecánica
Sus antecedentes:
- Las estructuras a nanoescala pueden exhibir estrés extremo, lo que lleva a propiedades materiales mejoradas como la alta movilidad de electrones en los transistores de silicio.
- La disipación mecánica en los sistemas nanomecánicos es un factor clave que limita su rendimiento y coherencia.
Objetivo del estudio:
- Investigar el uso de esfuerzo a nanoescala combinado con sujeción suave para reducir la disipación mecánica.
- Diseñar dispositivos nanomecánicos ultracoherentes con factores de calidad excepcionalmente altos.
Principales métodos:
- Fabricación de un nanohaz de nitruro de silicio independiente con un patrón de cristal fonónico no uniforme.
- Colocalización de la deformación y el movimiento de flexión dentro del haz nano.
- Mediciones de anillo a temperatura ambiente para caracterizar los modos de vibración y los factores de calidad.
Principales resultados:
- Demostración de los modos de vibración en forma de cuerda en el haz nano.
- Factores de calidad alcanzados (Q) de hasta 800 millones.
- Productos de frecuencia Q × observados superiores a 10 ^ 15 hertz, lo que indica una disipación ultra baja.
Conclusiones:
- La sujeción suave, una forma de ingeniería fonónica, reduce efectivamente la disipación mecánica cuando se combina con el estrés a nanoescala.
- El nano haz diseñado exhibe propiedades adecuadas para dispositivos nanomecánicos ultracoherentes.
- Este enfoque ofrece una vía prometedora para el desarrollo de sistemas nanomecánicos avanzados.
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