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Updated: Jul 3, 2026

Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
Peizhi Wang1, Fengzhou Fang1,2
1Centre of Micro/Nano Manufacturing Technology (MNMT-Dublin), University College Dublin, Dublin D4, Ireland.
点缺陷通过降低吸附能量和激光值,显著提高了激光诱导的原子层蚀刻 (ALE). 这种缺陷介导的机制使得高效,无损的Cl-Si的层次蚀刻成为可能.
11:14Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
06:57Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
Published on: July 17, 2020
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