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Fabrication of Micropatterned Hydrogels for Neural Culture Systems using Dynamic Mask Projection Photolithography
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逆光刻法物理知情深度神经水平设置用于面具优化.

Xing-Yu Ma, Shaogang Hao

    Applied optics
    |December 1, 2023
    PubMed
    概括

    我们介绍了一个反光刻法物理知情深度神经水平集 (ILDLS) 方法用于面具优化. 这种方法显著提高了集成电路的打印能力和工艺窗口,同时提高了与传统方法相比的计算效率.

    科学领域:

    • 集成电路制造 集成电路制造
    • 计算式 lithography 的使用方法.
    • 深度学习应用程序

    背景情况:

    • 光学近距离校正 (OPC) 对高分辨率集成电路至关重要.
    • 基于水平集的反光刻技术 (ILT) 提供了卓越的图案保真性,但却面临着高计算成本的困难.
    • 深度学习 (DL) 可以加速ILT,但缺乏用于过程窗口增强的特定领域知识.

    研究的目的:

    • 开发一个高效的面具优化技术,用于集成电路光刻.
    • 在先进的半导体制造中,提高可打印性和工艺窗口 (PW).
    • 结合ILT和DL的优势,改进面具设计.

    主要方法:

    • 提出了一个反向光刻物理知情深度神经水平集 (ILDLS) 方法.
    • 基于集成水平集的ILT作为深度学习框架中的一个层.
    • 采用代口罩预测和纠正以进行优化.

    主要成果:

    • 与纯DL和ILT方法相比,ILDLS显著提高了可打印性和工艺窗口.
    • 与传统的ILT相比,计算效率取得了实质性的改进.
    • 证明了将基于物理的知识集成到DL中以优化面具的有效性.

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    结论:

    • ILDLS方法为半导体光刻学中面罩优化提供了一种新且高效的解决方案.
    • 结合DL与反光刻法物理知识,克服了独立方法的局限性.
    • 这种混合方法对先进的集成电路制造有希望.