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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
Yu Katsumi1,2, Hironori Gamo1,2, Junichi Motohisa1,2
1Graduate School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan.
在III-V半导体中的晶相异质连接 (CPHJ) 能够实现新的垂直晶体管. 这种新方法提供了改进的门控制和高电流,推进了超越二维材料的晶体管技术.
08:50Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
05:39Scalable Quantum Integrated Circuits on Superconducting Two-Dimensional Electron Gas Platform
Published on: August 2, 2019
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