,使.

Swayam Prakash Sahoo1,2,3, Matthieu Bugnet4, Ingrid Cañero Infante5

  • 1Ecole Centrale Lyon INSA Lyon Université Claude Bernard Lyon 1 CNRS Institut des Nanotechnologies de Lyon (INL) UMR 5270 69130 Ecully France.

Small science
|April 11, 2025
PubMed
概括

使用氧化 (HZO) 缓冲层在上集成的二氧化 (VO2) 薄膜显示出明显减少的金属绝缘体过渡歇斯底里. 这种HZO缓冲器使微电子的VO2设备可靠运行.

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