Ta_{2}NiSe_{5},

Zijing Chen1,2,3, Chenhang Xu4,5, Chendi Xie6

  • 1Shanghai Jiao Tong University, Key Laboratory for Laser Plasmas (Ministry of Education), School of Physics and Astronomy, Shanghai 200240, China.

Physical review letters
|September 15, 2025
PubMed
概括

在Ta2NiSe5中,绝缘差距主要是由结构变化引起的,而不是刺激效应. MeV超快电子衍射揭示了原子位移,解释了这种候选激发性绝缘体中光诱导的间隙缩小.

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