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Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used....
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Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
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基于人工智能的分析算法,包括纳米尺度结构变化和光谱圆测量中的测量角度错位.

Juwon Jung1, Leeju Hwang1, Nagyeong Kim1

  • 1Department of Mechanical Engineering, Yonsei University, Seoul, Republic of Korea.

Nanophotonics (Berlin, Germany)
|December 22, 2025
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概括

本研究引入了一种先进的光谱圆测量 (SE) 分析框架,以准确地描述纳米结构,计算变化并改进制造业的计量学.

关键词:
制造过程引起的结构变化.测量角度 - 测量角度纳米结构是一种纳米结构.谱学圆测量法 谱学圆测量法

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科学领域:

  • 材料科学 材料科学 材料科学
  • 纳米技术纳米技术
  • 光学计量学 在光学计量学

背景情况:

  • 光谱圆测量 (SE) 对于纳米尺度的表征至关重要,但受到完美的周期性假设的限制.
  • 制造变化和测量错误降低了传统SE数据分析的准确性.
  • 准确的计量学对于半导体,光子学和显示器的先进制造工艺至关重要.

研究的目的:

  • 开发一个增强的SE分析框架,解决纳米尺度结构变化和测量错位问题.
  • 为了提高基于SE的计量技术的精度和可靠性,用于工业应用.
  • 为了使纳米结构的高通量表征具有高精度.

主要方法:

  • 开发了一个增强的SE分析框架,使用平均穆勒矩阵 (MM) 来表示结构分布.
  • 引入了用于快速MM生成的高通量神经网络,接近严格的合波分析 (RCWA) 模拟.
  • 对SiO2纳米的RCWA模拟验证了框架,并将其应用于实验MM数据.

主要成果:

  • 在MM-generation模型中,对RCWA数据的平均平方误差为9.99 × 10^-8 MSE.
  • 与SEM相比,增强的分析框架实现了低于0.4nm的维度预测误差.
  • 证明了纳米结构的准确表征,包括1DSiO2纳米.

结论:

  • 开发的SE分析框架显著提高了纳米结构的计量精度.
  • 这种方法可以考虑制造变化和测量错误,改善结构参数预测.
  • 该框架有可能在半导体,光子和显示器制造领域推进高精度计量技术.