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Yanping Lan1, Jingchao Qi1, Mengxi Gui2
1Shanghai Yuwei Semiconductor Technology Co., Ltd., Shanghai 201203, China.
本研究引入了一种使用双波长光学和深度学习进行精确半导体覆盖测量的综合方法. 该方法在先进的工艺节点中提高了准确性和效率.
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