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Updated: Aug 14, 2026

Electron Channeling Contrast Imaging for Rapid III-V Heteroepitaxial Characterization
Published on: July 17, 2015
Stability-instability transitions in silicon crystal growth
1NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi-Shi, Kanagawa 243-0198, Japan.
Abstract:
In order for a crystal to grow, source atoms must be incorporated into the underlying lattice. Typically, this process occurs on the surface in one of two modes: either through island nucleation or through step flow. However, a third, morphologically unstable growth mode has been predicted. Monitoring the surface of ultraflat substrates with an in situ scanning electron microscope, we prove that for the (111) face of silicon there is a transition from stable step flow to morphological instability and then to island nucleation.
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