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Advances in Atom Probe Specimen Fabrication from Planar Multilayer Thin Film Structures
D J. Larson1, B D. Wissman, R L. Martens
1Recording Head Operations, Seagate Technology, 7801 Computer Avenue South, NRW102, Bloomington, MN 55435
Summary
A new method fabricates sharp needle-shaped specimens from multilayer thin films for atom probe analysis. This technique achieves atomic-layer resolution across interfaces in magnetic thin film structures.
Area of Science:
- Materials Science
- Nanotechnology
- Analytical Chemistry
Background:
- Atom probe tomography (APT) requires precisely shaped specimens for high-resolution analysis.
- Analyzing multilayer thin films presents challenges in resolving interfaces at the atomic scale.
Purpose of the Study:
- To develop a reliable sample preparation method for atom probe analysis of multilayer thin films.
- To enable atomic-layer spatial resolution of composition profiles across interfaces.
Main Methods:
- Fabrication of sharp needle-shaped specimens from multilayer thin films on silicon substrates.
- Utilizing standard silicon etching techniques and focused ion-beam milling.
- Orienting specimens for layer normals parallel to the needle axis for compositional profiling.
Main Results:
- Successful fabrication of specimens suitable for atom probe analysis.
- Demonstration of atomic-layer spatial resolution across interfaces in a NiFe/CoFe/Cu/CoFe thin film structure.
- Validation of the technique's feasibility and utility for complex multilayer systems.
Conclusions:
- The developed method provides a pathway for high-resolution interfacial analysis in multilayer thin films using atom probe tomography.
- This technique is crucial for understanding the structure-property relationships in advanced materials.
- The approach is applicable to various multilayer thin film systems requiring atomic-scale compositional characterization.