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Structural modification on silica glass surface induced by thermal poling for second harmonic generation
Journal of Synchrotron Radiation
|August 22, 2001
Summary
Thermal poling treatment structurally modifies Herasil silica glass surfaces, affecting the network and defects. Even after depoling, the original structure is not fully restored, impacting second harmonic generation properties.
Area of Science:
- Materials Science
- Solid State Physics
- Spectroscopy
Background:
- Bulk Herasil silica glass exhibits second harmonic generation (SHG) after thermal poling.
- Surface structural modifications are crucial for understanding SHG in silica glass.
Purpose of the Study:
- To investigate the structural changes in Herasil silica glass surfaces induced by thermal poling.
- To correlate these structural modifications with second harmonic generation (SHG).
- To elucidate the role of network and defect alterations in the poling process.
Main Methods:
- O-K edge X-ray Absorption Near Edge Structure (XANES) spectroscopy was employed to analyze surface structure.
- Theoretical calculations using a full multiple scattering approach were performed on model silicon dioxide clusters.
- XANES spectra were analyzed at various stages of the thermal poling and depoling treatment.
Main Results:
- XANES spectroscopy revealed significant structural modifications on the glass surface due to thermal poling.
- These modifications involve the breaking of Si-O-Si bridging bonds within the silica network and defects.
- Thermal depoling led to the reformation of bridging bonds, but the initial unpoled structure was not recovered.
Conclusions:
- Thermal poling induces irreversible structural changes on the surface of Herasil silica glass.
- The observed structural modifications are directly linked to the generation and erasure of second harmonic generation (SHG).
- The study highlights the sensitivity of silica glass surface structure to thermal treatments and its impact on optical properties.