A high power density submicron electron beam source
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Published on: September 14, 2018
1Institute for Analytical Instrumentation RAS, Rizhskij Prospect 26, Sankt-Petersburg 198103, Russia. ptitsin@iai.rssi.ru
Abstract:
An electron-optical system (with a thermal field electron source-cathode) is introduced. The system is designed to form on the target surface submicron microprobes of a power density exceeding the ablation threshold ( approximately 10(8)W/cm(2)) of condensed media. The numerical modeling of electron paths carried out using a software package (TAU) developed by the authors has shown that the proposed electron-optical system is capable of forming microprobes of a power density comparable with that of modern high-power pulsed laser sources (up to approximately 10(11)W/cm(2)).
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