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Updated: Aug 7, 2026

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
Performance of AlGaN/GaN high electron mobility transistors at nanoscale gate lengths
J W Johnson1, F Ren, S J Pearton
1Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA.
Abstract:
The DC and RF performance of AlGaN/GaN high electron mobility transistors with nanoscale gate lengths is presented. The layer structures were grown by either metal organic chemical vapor deposition or rf plasma-assisted molecular beam epitaxy. Excellent scaling properties were observed as a function of both gate length and width and confirm that these devices are well suited to both high speed switching and power microwave applications.
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