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Solvent-resistant photocurable liquid fluoropolymers for microfluidic device fabrication [corrected]
Jason P Rolland1, R Michael Van Dam, Derek A Schorzman
1Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina, 27599, USA.
Journal of the American Chemical Society
|February 26, 2004
Summary
Researchers developed a novel solvent-compatible microfluidic device using photocurable perfluoropolyethers (PFPEs). This "Liquid Teflon" material offers superior chemical resistance, overcoming limitations of traditional poly(dimethylsiloxane) for advanced microfluidic applications.
Area of Science:
- Materials Science
- Chemical Engineering
- Microfluidics
Background:
- Poly(dimethylsiloxane) (PDMS) is widely used in microfluidics but swells in organic solvents, limiting applications.
- This swelling disrupts microchannel integrity and fluid flow, necessitating alternative materials.
Purpose of the Study:
- To fabricate a microfluidic device using solvent-compatible photocurable perfluoropolyethers (PFPEs).
- To address the limitations of PDMS in microfluidic applications involving organic solvents.
Main Methods:
- Developed a microfluidic device using photocurable PFPEs, termed "Liquid Teflon".
- Employed established fabrication and valve actuation procedures similar to PDMS devices.
- Utilized photocuring for rapid device fabrication, reducing time from hours to minutes.
Main Results:
- The PFPE-based device demonstrated remarkable resistance to organic solvents.
- Mechanical properties of the PFPE elastomer were comparable to Sylgard 184.
- Photocuring significantly decreased fabrication time.
Conclusions:
- Photocurable PFPEs offer a viable, solvent-compatible alternative to PDMS for microfluidic devices.
- This material innovation enables new microfluidic applications previously hindered by solvent incompatibility.
- The rapid fabrication process enhances the practicality of PFPE-based microfluidic systems.