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Updated: Aug 10, 2026

Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition
Published on: July 26, 2016
Critical role of surface steps in the alloying of Ge on Si(001)
J B Hannon1, M Copel, R Stumpf
1IBM Research Division, T.J. Watson Research Center, Yorktown Heights, New York 10598, USA.
Abstract:
Using low-energy electron microscopy, we show that intermixing of Ge on Si(001) during growth is enhanced on stepped surfaces and is hindered on terraces where step flow does not occur. On large terraces we have identified a dramatic and unanticipated structural rearrangement that facilitates intermixing: Pairs of steps spontaneously form and migrate over the surface, leaving alloyed regions in their wake. The driving force for step formation is the entropy gain associated with the enhanced intermixing of Ge.
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