(Ta/Si) multilayer as a wide-bandpass monochromator material
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Published on: July 18, 2015
Y J Park1, H S Youn, S Banerjee
1Beamline Research Division, Pohang Accelerator Laboratory, POSTECH, Pohang 790-784, Korea.
Journal of Synchrotron Radiation
|July 21, 2004
Abstract:
Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)(60) multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide-bandpass monochromator for X-ray scattering experiments of polymers has been tested.
