Effect of signal frequency and masker level on the frequency regions responsible for the overshoot effect

Two experiments investigated the relative influence of components close to and remote from the signal frequency (fs) on the overshoot effect. Overshoot was defined as the difference in threshold between a signal presented 4 ms after, and that for one presented 300 ms after, the onset of a 350-ms masker. Experiment 1 measured the overshoot effect using both wideband and narrow-band maskers (centered on fs), at two signal frequencies and three masker levels. Experiment 2 used a masker consisting of a "middle band" (MB, centered on fs) and two flanking bands (FBs, which, when combined with the MB, produced a flat wideband spectrum). The masker was continuous except for a 300-ms interval just prior to the signal, during which either all three bands, the MB alone, or the FBs alone were turned off. The results of both experiments showed that the overshoot effect was usually determined by off-frequency components. However, the on-frequency components played a substantial role when signal-to-noise ratios (SNRs) at threshold were unusually high, such as at fs = 6500 Hz and intermediate masker levels. It is suggested that two different mechanisms contribute to the overshoot effect: an off-frequency mechanism which operates at all fs and masker levels, and an on-frequency mechanism which contributes to the overshoot effect only at high-threshold SNRs.