Youngmi Kim1, Timothy M Swager
1Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Poly(p-phenylenevinylene)s with trifluoromethyl groups show excellent resistance to light-induced oxidation. These robust materials are ideal for challenging applications requiring durable performance.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: