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Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities
Published on: November 30, 2012
Waveguide sidewall roughness measurement on full wafers by SEM-based stereoscopy
1Laboratory of Photonic Systems, Parc d'innovation, Bld S. Brant 67400 Illkirch, France. alexis.bony@sphot.u-strabsg.fr
Journal of Microscopy
|February 24, 2005
Abstract:
We present a technique aiming at sidewall roughness measurement on integrated optical silica waveguides using a scanning electron microscope. The technique uses the principles of stereoscopy to retrieve sidewall topography. Practical implementation details and first results are provided.
