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Analysis of the loss resulting from point defects for an etched diffraction grating demultiplexer by using the method
Jun Song1, Ning Zhu, Sailing He
1Center for Optical and Electromagnetic Research, State Key Laboratory of Modern Optical Instrumentation, Joint Laboratory of Optical Communications of Zhejiang University, Zhejiang University, Yu-Quan, Hangzhou, 310027, China. songjun@coer.zju.edu.cn
Abstract:
An effective method for analyzing the effect of point defects (e.g., dust grains and air bubbles) on an etched diffraction grating demultiplexer is presented by using the method of moments. This method leads to a deep insight into the influence of point defects on the loss of the demultiplexer. Numerical results show that strong resonance losses can be produced at some special point defects and incident light.
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