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Pulsed laser deposition chamber for in situ X-ray diffraction
Vedran Vonk1, Stan Konings, Laurent Barthe
1European Synchrotron Radiation Facility, 38043 Grenoble, France.
Journal of Synchrotron Radiation
|October 22, 2005
Summary
A new sample chamber enables in situ surface X-ray diffraction studies of thin film growth. This setup allows for precise control of temperature and oxygen pressure during pulsed laser deposition, yielding initial results for strontium titanate films.
Area of Science:
- Materials Science
- Surface Science
- Thin Film Deposition
Background:
- Pulsed laser deposition (PLD) is a key technique for thin film fabrication.
- In situ monitoring of thin film growth is crucial for understanding and controlling deposition processes.
- Surface X-ray diffraction (SXRD) provides atomic-level information about surface and interface structures.
Purpose of the Study:
- To design and construct a novel sample chamber for in situ SXRD studies of thin film growth.
- To enable the investigation of thin film deposition dynamics under controlled environmental conditions.
- To demonstrate the capability of the system with initial experimental results.
Main Methods:
- Construction of a specialized sample chamber compatible with SXRD.
- Integration of pulsed laser deposition within the SXRD environment.
- Precise control over sample temperature (RT to 1073 K) and oxygen partial pressure (0.1 to 10^5 Pa).
Main Results:
- Successful demonstration of in situ SXRD during PLD.
- Observation of intensity oscillations in the diffracted signal.
- Homoepitaxial growth of strontium titanate (SrTiO3) thin films was studied.
Conclusions:
- The developed sample chamber is effective for in situ SXRD studies of thin film growth.
- The system allows for real-time monitoring of deposition dynamics.
- Intensity oscillations confirm layer-by-layer growth and provide insights into the homoepitaxial deposition of SrTiO3.