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Related Experiment Videos

Terbium-based extreme ultraviolet multilayers.

David L Windt1, John F Seely, Benjawan Kjornrattanawanich

  • 1Columbia Astrophysics Laboratory, New York, New York 10027, USA. windt@astro.columbia.edu

Optics Letters
|December 14, 2005
PubMed
Summary
This summary is machine-generated.

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New extreme ultraviolet (EUV) reflective coatings using silicon/terbium (Si/Tb) multilayers achieve over 20% reflectance near 60 nm. These narrowband coatings show promise for solar physics instrumentation.

Area of Science:

  • Materials Science
  • Optics
  • Physics

Background:

  • Developing efficient reflective coatings for the extreme ultraviolet (EUV) spectrum is crucial for advanced optical instrumentation.
  • Existing multilayers often lack sufficient performance or stability in the ~60 nm wavelength range.

Purpose of the Study:

  • To fabricate and characterize novel periodic multilayers for narrowband reflective coatings in the EUV.
  • To evaluate the performance and stability of Si/Tb and SiC/Tb multilayers near 60 nm.

Main Methods:

  • Fabrication of Si/Tb and SiC/Tb periodic multilayers.
  • Characterization of optical properties including peak reflectance and spectral bandpass (FWHM).
  • Analysis using transmission electron microscopy (TEM) and thermal annealing experiments.

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Main Results:

  • Achieved peak reflectance exceeding 20% near normal incidence at ~60 nm.
  • Si/Tb multilayers exhibited a spectral bandpass of 6.5 nm FWHM, while SiC/Tb showed a broader 9.4 nm FWHM.
  • TEM revealed polycrystalline Tb, amorphous Si, and interlayers; Si/Tb demonstrated stability up to 100°C.

Conclusions:

  • Si/Tb and SiC/Tb multilayers offer efficient narrowband reflective properties in a previously underserved EUV region.
  • These coatings are suitable for normal incidence instrumentation, particularly for solar physics applications targeting specific emission lines (e.g., O V, Mg X).
  • The demonstrated stability and performance indicate potential for widespread use in EUV optics.