Related Experiment Video
Updated: Aug 13, 2026
Rendering SiO2/Si Surfaces Omniphobic by Carving Gas-Entrapping Microtextures Comprising Reentrant and Doubly Reentrant Cavities or Pillars
Published on: February 11, 2020
Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects
Shun-Der Wu1, Thomas K Gaylord, Jonathan S Maikisch
1School of Electrical and Computer Engineering, Microelectronics Research Center, Georgia Institute of Technology, Atlanta, Georgia 30332, USA. gte782q@gmail.com
Abstract:
The optimum profiles of right-angle-face anisotropically etched silicon surface-relief gratings illuminated at normal incidence for substrate-mode optical interconnects are determined for TE, TM, and random linear (RL) polarizations. A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis is used. The optimum diffraction efficiencies of the -1 forward-diffracted order are 37.3%, 67.1%, and 51.2% for TE-, TM-, and RL-polarization-optimized profiles, respectively. Also, the sensitivities to grating thickness, slant angle, and incident angle of the optimized profiles are presented.
More Related Videos
10:39Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating
Published on: October 11, 2016
06:57Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
Published on: July 17, 2020