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Obtaining 3D Chemical Maps by Energy Filtered Transmission Electron Microscopy Tomography
Published on: June 9, 2018
Quantitative secondary electron energy filtering in a scanning electron microscope and its applications
P Kazemian1, S A M Mentink, C Rodenburg
1Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ, UK. pk252@cam.ac.uk
This study introduces quantitative energy filtering in a scanning electron microscope (SEM) for precise 2D dopant mapping. The method enhances accuracy for semiconductor analysis, overcoming previous limitations in standard SEM imaging.
Area of Science:
- Materials Science
- Semiconductor Physics
- Analytical Chemistry
Background:
- Two-dimensional dopant mapping using SEM offers rapid, high-resolution analysis with minimal sample prep.
- Current SEM techniques lack reliable quantification, limiting widespread application.
- Quantitative energy filtering is needed to improve the accuracy of dopant concentration measurements.
Purpose of the Study:
- To develop and validate a quantitative energy-filtering method for SEM-based dopant mapping.
- To address the limitations of standard SEM imaging for accurate dopant analysis.
- To establish reliable quantification for secondary electron energy distributions.
Main Methods:
- Utilized a through-the-lens (TTL) detector in a field emission gun SEM (FEG-SEM).
- Quantified energy filtering by measuring the linear shift in secondary electron (SE) energy distribution with variable specimen bias.
- Employed copper wire samples and ray-tracing simulations for validation.
Main Results:
- Determined the experimental detector response (R(exp)) values ranging from 2.42±0.04 to 3.01±0.05.
- Validated results against ray-tracing simulations, establishing recommendations for the TTL detector's linear range.
- Successfully measured the potential difference across a Si pn-junction as 0.81±0.10 V.
Conclusions:
- Quantitative energy filtering with a TTL detector enables accurate 2D dopant mapping in FEG-SEM.
- The developed method overcomes previous quantification challenges in SEM dopant analysis.
- This technique provides a reliable approach for characterizing semiconductor materials.
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